HJT Tandem Perovskite Coating Production Line

This equipment is specially designed for the HJT tandem perovskite coating production line, capable of coating silicon wafer sizes of 182mm*105mm, while also compatible with functional layer coating of 210mm*105mm.

This coating equipment system includes: Coater (with solution supply system), environmental enclosure (with organic solvent treatment device), silicon wafer handling robot mechanism (with cassette lift and transfer mechanism), and electrical control unit.

This system uses a fully automatic mechanical transfer method to place the substrate onto the coating platform and position it for fixation. The coating die, controlled by a linear motor, applies the functional solution. The sample then undergoes IR infrared heating for pre-curing and drying, and finally the coated sample is automatically transferred to a cassette for unloading.

This coating system is the first mass-production-takt, fully automatic crystalline silicon tandem perovskite coating production line in China.

Technical Specifications

  • Overall External Dimensions (mm)
    7500*4000*2500
  • Substrate Size (mm)
    210*105/182*105
  • Die Automatic Adjustment Accuracy (μm)
    2
  • Speed Control Range (mm/s)
    1-200
  • Coated Dry Film Thickness (nm)
    10-800
  • Coating Solution Solid Content (%)
    1-70
  • Coating Solution Viscosity (cps)
    1-100
  • Production Takt (pcs/h)
    ≥60
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