Automated Coating Three-Piece Set Equipment

Automated three-piece set for crystalline silicon tandem perovskite solar cell coating, specially designed for functional layer coating on 182mm*182mm silicon wafers.

This system includes: Coater (with solution supply system), environmental enclosure (clean dust removal, with organic solvent treatment device), silicon wafer handling robot mechanism, VCD flash extraction equipment, stack furnace annealing equipment, and electrical control unit, etc.

This system performs fully automatic wafer pickup from a cassette lift, then completes coating -> VCD vacuum solvent extraction -> stack furnace annealing, and finally unloads back into the cassette – all three processes are fully automated.

Technical Specifications

Coater
Overall External Dimensions (mm) 1880*1550*2200
Substrate Size (mm) 182*182
Die Automatic Adjustment Accuracy (μm) 2
Speed Control Range (mm/s) 1-200
Coated Dry Film Thickness (nm) 10-800
Coating Solution Solid Content (%) 1-70
|Coating Solution Viscosity (cps) 1-100
|Production Takt Time (pcs/h) ≥60
VCD Flash Extraction Equipment
Evacuation Method Bottom evacuation
Loading/Unloading Method Manual/Automatic switchable
Substrate Specification 182mm*182mm silicon wafer, thickness ≥100um
Evacuation Time ATM-10Pa≤I0s
Ultimate Vacuum ≤1Pa
Leak Rate ≤1*10-9Pa*m³ /s
Vent Time 10Pa-ATM:5-10s adjustable
Takt Time 60s
MFC N2 Flow Rate 0-2SLM adjustable
Stack Furnace Annealing Equipment
Product Size ≥200*200am
Process Chamber Max Temperature 200℃
Process Operating Temperature Range RT~200℃
Within Substrate ≤士3%℃
Between Substrates ≤士3%℃
Temperature Accuracy ≤士1℃
Chamber Heating Rate RKT-150℃≤8min
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